Titanium Sputtering Target

Application:  Widely used for producing TiN/TiC/TiO2 etc.. Ceramic film, widely used in various kinds of Optical glass, Architecture and Automotive glass, Touch panel AR film and protective film, protective hard film of metal pares, Low-E glass film

Physical and Chemical Properties
Chemical Composition: Ti
Molding process: Melting
Density: ≥4.5g/cm3(100%)
Purity: 99.9%,99.95%,99.99%

Maximum  Machining Size
L 4000MM    T 6-13MM
Straight & Dogbone